Service Line: 04 Imaging and Characterization
Raith Scanning Electronic Microscope
Integral to the Raith 150 E-beam Lithography system is the Zeiss/Leo FESEM column. This ultra-high performance Scanning Electron Microscope column facilitates imaging and navigation of the sample, providing a maximum magnification of 1,000,000X, as well as multiple aperture and voltage settings.
Model: Part of the 150 E-beam Lithography System
Grigg Hall, First Floor Room: 153 Bay Number: N/A