Raith SEM

Service Line: 04 Imaging and Characterization
Raith SEM
Raith Scanning Electronic Microscope

Integral to the Raith 150 E-beam Lithography system is the Zeiss/Leo FESEM column.  This ultra-high performance Scanning Electron Microscope column facilitates imaging and navigation of the sample, providing a maximum magnification of 1,000,000X, as well as multiple aperture and voltage settings.

Manufacturer: Raith
Model: Part of the 150 E-beam Lithography System

Contact:
Lou Deguzman
704-687-8111
pcdeguzm@uncc.edu

Tool Location:

Grigg Hall, First Floor            Room: 153            Bay Number: N/A