The Imprio 100 from MII is a high-resolution step-and-repeat replication system capable of sub-50 nm lithography.  Similar to an optical stepper, a template is needed which has the desired patterns  for printing across the wafer.  Dense, high-resolution nanostructures can be printed over a large area in a relatively short time, unlike e-beam lithography.

The technology called Step and Flash Imprint Lithography uses low viscosity, UV-curable imprint resist and low imprint pressure to achieve high fidelity imprints.  A fused silica template is gently pressed into a thin layer of resist., which is then exposed in UV-light, then the template is separated leaving a replica of the pattern on the substrate.

Specifications:
· Resolution : sub-50 nm;, limited by imprint template
· Alignment : < 500 nm,
· Wafer handling: up to 8-inch diameter wafers,
-  6”, 4” and 3” diameter wafer chucks available
· Field size : 25 mm maximum
· Mini-environment:  better than ISO Class 3

Manufacturer: Molecular Imprints Inc
Model: Imprio 100

Contact:
Lou Deguzman
704-687-8111
pcdeguzm@uncc.edu