The Solaris 150 is a manual loading benchtop RTP system for R&D and pre-production. The system can process up to 150mm-dia substrates at a temperature range of (RT-1300)oC.

The Solaris uses a unique PID process controller that ensures accurate temperature stability and uniformity. The system has two interlocked MFCs for N2 and Ar gas processing.

The Solaris is designed for silicon implant annealing and monitoring, compound semiconductor implant activation and ohmic contact alloying.