Molecular Imprints’, Inc. Imprio 100 Step and Flash Imprint Lithography (S-FIL™) System is based on the ancient craft of embossing with an adaptation to modern needs. The technique uses a fused silica template with features etched into it.  The fused silica surface, covered with a release layer, is gently pressed into a thin layer of low viscosity, silicon-containing monomer. When illuminated by a UV mercury arc lamp, the surface is polymerized into a hard material. Upon separation of the fused silica template, the pattern is left on the surface of the substrate. A residual layer of polymer between features is eliminated by an etch process, and a replica of the pattern is produced on the substrate surface. S-FIL has several important advantages over conventional optical lithography. The parameters in the classic photolithography resolution formula (k1, NA, and lambda) are not relevant to S-FIL.  The resolution of S-FIL is a direct function of the resolution of the template fabrication process.  S-FIL templates are typically fabricated using conventional optical phase-shift mask technology, which takes advantage of the resolution offered by e-beam technology.   Features as small as 20 nm have been made to date.